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| Hugrass, W and Ohnishi, M and Chikano, T and Tsukamoto, M, “An extreme ultraviolet source for photolithographic applications based on rotamak discharge”, Japanese Journal of Applied Physics, 49 (1) pp. 1-4. ISSN 0021-4922 (2010) [Refereed Article] | |
| Data Type | Value |
|---|---|
| Type of Research | Experimental Development |
| Research Division | Physical Sciences |
| Research Group | Nuclear and plasma physics |
| Research Field | Plasma physics; fusion plasmas; electrical discharges |
| Research Objective Division | Expanding Knowledge |
| Research Objective Group | Expanding knowledge |
| Research Objective Field | Expanding knowledge in the physical sciences |
| Visit Item on eCite | http://ecite.utas.edu.au/62799 |
| Digital Object Identifier | doi:10.1143/JJAP.49.016201 |
| Scopus Source URL | View the full record on Scopus |
| Scopus Citing URL | View the list of citing articles on Scopus |
| Web of Science® Source URL | View the full record on Web of Science® |
| Web of Science® Related URL | View the list of related articles on Web of Science® |
| Number of Downloads | 1 |