Web Access Research Portal
Research Output Details
| Ohnishi, M and Hugrass, W and Miyake, Y and Shimizu, T and Hanatani, KE and Osawa, H, “Novell EUV light sources for photolithography”, Proceedings 2012 International Workshop on EUV Lithography, 4-8 June 2012, Maui, Hawaii EJ (2012) [Conference Extract] | |
| Data Type | Value |
|---|---|
| Type of Research | Applied Research |
| Research Division | Physical Sciences |
| Research Group | Nuclear and plasma physics |
| Research Field | Plasma physics; fusion plasmas; electrical discharges |
| Research Objective Division | Manufacturing |
| Research Objective Group | Computer, electronic and communication equipment |
| Research Objective Field | Integrated circuits and devices |
| Visit Item on eCite | http://ecite.utas.edu.au/79879 |